TY - JOUR
AU - Li, Fanxing
AB - In the micro-nano structure manufacturing field, large field of view, flexibility, and single exposure are the advantages of laser interference lithography. However, this method can only produce periodic patterns. In this paper, laser interference lithography and optical field modulation techniques are combined. By adjusting the parameters such as the phase and amplitude of the incident light beam, a light field modulation interference model was constructed to study the relationship between the parameters of the incident light beam and the intensity distribution of the interference light field. We verified the feasibility of the method through simulation. Considering the performance of existing optical modulation devices such as the pixel size of spatial light modulators, we discuss the challenges of this approach and the actual resolution that can be achieved. There is no doubt that this provides a new direction for the preparation of multiscale, variable period micro-nano patterns.
TI - Double-beam laser interference lithography based on optical field modulation
JF - Proceedings of SPIE
DO - 10.1117/12.2510947
DA - 2019-02-06
UR - https://www.deepdyve.com/lp/spie/double-beam-laser-interference-lithography-based-on-optical-field-rRBKqT94hP
SP - 108421C
EP - 108421C-5
VL - 10842
IS - 
DP - DeepDyve
ER -