TY - JOUR
AU1 - Abiade, Jeremiah T.
AB - RESEARCH/RESEARCHERS First, the investigators patterned fuel Electrochemical Polishing radii (20 μm) are capable of interacting channels of 80–90 μm depth by photolithog- Technique Yields Apparatus with multiple beads, they said. Electro- raphy and wet etching a highly doped Si for Manipulation of Micro- polishing to smaller radii (0.1–6 μm) wafer. An n-type Si wafer was chosen allows selective capturing of single mag- to Nanometer-Sized Magnetic Beads because of its higher wet-etching rate with To date, the application of miniature netic beads. The researchers demonstrated low resistivity to ensure it worked as a cur- electromagnets for molecular and cellular removal of a single 4.5 μm superparamag- rent collector. A 100 nm copper layer was manipulation has been limited by weak netic bead from a group of similar ones, sputtered on the Si wafer to supply current magnetic field gradients and resultant less than 10 μm from each other. It is then from a potentiostat. On the opposite side, weak magnetic forces that are produced possible, they said, to relocate the bead by anodization of the Si wafer in a 46% HF- by these devices. A further complication moving the needle and simply shutting off ethanol solution using a current density 
TI - Electrochemical Polishing Technique Yields Apparatus for Manipulation of Microto Nanometer-Sized Magnetic Beads
JF - MRS Bulletin
DO - 10.1557/mrs2004.227
DA - 2004-11-01
UR - https://www.deepdyve.com/lp/springer-journals/electrochemical-polishing-technique-yields-apparatus-for-manipulation-pu1Wlkn13c
SP - 795
EP - 795
VL - 29
IS - 11
DP - DeepDyve
ER -