TY - JOUR
AU - Ishihara, Kazuki
AB - Polarization modulated spectroellipsometer was utilized to monitor, in-situ, deposition of Ag on Si substrate. The angle of incidence was determined using a Si substrate covered with native oxide. In the wavelength region of 550 nm to 700 nm, the ambiguity of the angle of incidence was within 0.2 deg. A plasma resonance peak manifested in reflectance spectrum around 350 nm increased and shifted to shorter wavelength as the deposition time increased from 1 sec to 10 sec. (Delta) (Psi) trajectory approached to a simulation curve of a continuous film as the deposition time increased to 40 sec where the film thickness was estimated to be 20 nm.
TI - In-situ ultrahigh vacuum spectroscopic ellipsometry
JF - Proceedings of SPIE
DO - 10.1117/12.246213
DA - 1996-08-16
UR - https://www.deepdyve.com/lp/spie/in-situ-ultrahigh-vacuum-spectroscopic-ellipsometry-obVmB8h8fT
SP - 180
EP - 183
VL - 2873
IS - 1
DP - DeepDyve
ER -