TY - JOUR
AU - Meyyappan, M.
AB - Fluid flow related issues in plasma process equipment design for 300 mm wafer processing are considered. A direct simulation Monte Carlo technique is used to simulate molecular chlorine flow and chlorine atom etching of polysilicon. The effects of process chamber diameter, wafer location, and exit design on processing uniformity are investigated, and guidelines are provided regarding the choices for these parameters.
TI - A Direct Simulation Monte Carlo Study of Flow Considerations in Plasma Reactor Development for 300 mm Processing
JF - Journal of the Electrochemical Society
DO - 10.1149/1.1838126
DA - 1997-11-01
UR - https://www.deepdyve.com/lp/iop-publishing/a-direct-simulation-monte-carlo-study-of-flow-considerations-in-plasma-mjKZRuhNbs
SP - 3999
EP - 4004
VL - 144
IS - 11
DP - DeepDyve
ER -