TY - JOUR
AU1 - Wong, William S.
AU2 - Chabinyc, Michael L.
AU3 - Limb, Scott
AU4 - Ready, Steven E.
AU5 - Lujan, René
AU6 - Daniel, Jurgen
AU7 - Street, Robert A.
AB - Abstract— A non‐contact jet‐printed mask‐patterning process is described. By combining digital imaging with jet printing, digital lithography was used to pattern a‐Si:H‐based electronics on glass and plastic substrates in place of conventional photolithography. This digital lithographic process is capable of layer‐to‐layer registration of ±5 μm using electronic mask files that are directly jet printed onto a surface. Aminimum feature size of 50 μm was used to create 180 × 180 element backplanes having 75‐dpi resolution for display and image‐sensor applications. By using a secondary mask process, the minimum feature size can be reduced down to ∼15 μm for fabrication of short‐channel thin‐film transistors. The same process was also used to pattern black‐matrix wells in fabricating color‐filter top plates in LCD panels.
TI - Digital lithographic processing for large‐area electronics
JF - Journal of the Society for Information Display
DO - 10.1889/1.2759551
DA - 2007-07-01
UR - https://www.deepdyve.com/lp/wiley/digital-lithographic-processing-for-large-area-electronics-mJWPCzfKA0
SP - 463
VL - 15
IS - 7
DP - DeepDyve
ER -