TY - JOUR
AU1 - Hummler, Klaus
AU2 - Zhu, Qiushi
AU3 - Behm, Keegan
AU4 - Matthes, Liane
AU5 - He, Zhaohan
AU6 - Biabani, Omar
AU7 - LaForge, Andrew
AU8 - Rollinger, Bob
AU9 - Urone, Dustin
AU1 - Kleemans, Niek
AU1 - Jurna, Martin
AU1 - McGrogan, Sean
AU1 - Mayer, Peter
AU1 - Purvis, Michael
AU1 - Derks, Sander
AU1 - Villalta, Alberto
AU1 - Govindaraju, Abhiram
AU1 - Ma, Yue
AU1 - Brown, Daniel
AB - EUV lithography systems are now fully deployed in the high-volume manufacturing of leading edge semiconductor devices. In this paper, we review the performance of ASML’s current generation light sources in the field and preview the next step in EUV source performance for the NXE:3800E system. The NXE:3800E system marks a substantial step forward in scanner productivity, delivering a remarkable increase of (+60 WPH) in throughput, made possible by an increase in EUV source power (to >500W). This significant increase in power was achieved through improvements in the droplet generator, higher power CO2 drive laser, improved collector design, and enhancements in our plasma controls required for higher plasma power. Details of these developments and their impact on system design and performance will be discussed, along with recent high-power performance demonstrations of the overall integrated EUV light source system.
TI - High-power EUV light sources (>500w) for high throughput in next-generation EUV lithography tools
JF - Proceedings of SPIE
DO - 10.1117/12.3010463
DA - 2024-04-10
UR - https://www.deepdyve.com/lp/spie/high-power-euv-light-sources-500w-for-high-throughput-in-next-lW4tijlQDY
SP - 129530V
EP - 129530V-8
VL - 12953
IS - 
DP - DeepDyve
ER -