TY - JOUR
AU - Okoshi, Masayuki
AB - We used 395-nm and 790-nm femtosecond laser pulses to deposit aluminum-doped zinc oxide films by pulsed laser deposition. Electrical resistivity of the films was lowered (5.6 x 10 4 (Omega) cm) at 200 degree(s)C for the 395-nm laser pulses, while maintaining the optical transparency. In addition, the deposition rate increased six times. Optical emission was measured to compare the plumes generated by 395-nm and 790-nm laser pulses. We found that the emission from ions was suppressed relative to neutral atoms. Also the kinetic energy of ejected species was nearly doubled for the 395-nm laser pulses.
TI - 395-nm and 790-nm femtosecond laser ablation of aluminum-doped zinc oxide
JF - Proceedings of SPIE
DO - 10.1117/12.405719
DA - 2000-11-06
UR - https://www.deepdyve.com/lp/spie/395-nm-and-790-nm-femtosecond-laser-ablation-of-aluminum-doped-zinc-kQJeVWw1AW
SP - 25
EP - 28
VL - 4088
IS - 1
DP - DeepDyve
ER -