TY - JOUR
AU - Kishimura, Shinji
AB - Two new concepts,"masking effect" and "internal CEL", are proposed to design a high resolution quinonediazide-novolak type photoresist. On the basis of these two design concepts, we optimized the composition of the resist, and succeeded in developing a high resolution resist, which is composed of m-cresol/p-cresol/xylenol/formaldehyde novolak resin and 2 ,3 ,4 , 4' -tetrahydroxybenzophenone 1 , 2 -naphtoquinonediaz ide-5 -sulfonate. This resist can resolve as small as 0.6 um lines & spaces with aspect ratio of 2.7 (NA.0.42) and has the gamma value of 2.0.
TI - "Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist
JF - Proceedings of SPIE
DO - 10.1117/12.968311
DA - 1988-01-01
UR - https://www.deepdyve.com/lp/spie/masking-effect-and-internal-cel-new-design-concepts-for-a-positive-jgHjYfch4U
SP - 134
EP - 141
VL - 92
IS - 
DP - DeepDyve
ER -