TY - JOUR
AU1 - Suhr, H.
AU2 - Etspüler, A.
AU3 - Feurer, E.
AU4 - Oehr, C.
AB - The plasma treatment of vapors containing organometallic compounds (of Pd, Ni, Co, Sn, Au) and various alkenes has been used to prepare thin films, the composition and electrical resistivity of which could be varied over a wide range.
TI - Plasma-deposited metal-containing polymer films
JF - Plasma Chemistry and Plasma Processing
DO - 10.1007/BF01016927
DA - 2005-01-06
UR - https://www.deepdyve.com/lp/springer-journals/plasma-deposited-metal-containing-polymer-films-itxqypp0Z1
SP - 9
EP - 17
VL - 8
IS - 1
DP - DeepDyve
ER -