TY - JOUR
AU - Copetti, C.
AB - The microstructural characteristics of high-temperature superconductor (HTSC) layers are investigated to evaluate three methods of submicron processing for cryoelectronics. UV, X-ray, and e-beam lithography are compared for YBa2Cu3O(7-x) films, and dry-etching is conducted with either reactive-ion or reactive-ion-beam etching equipment. X-ray and e-beam lithography are found to be the most effective methods in terms of pattern transfer and optimal resolution, respectively. Reactive-ion-beam etching is recommended as the most effective method for dry etching.
TI - High-resolution patterning of thin HTSC films: evaluation of lithography and dry etching
JO - Proceedings of SPIE
DO - 10.1117/12.56684
DA - 1992-03-01
UR - https://www.deepdyve.com/lp/spie/high-resolution-patterning-of-thin-htsc-films-evaluation-of-gAG32E0CSL
SP - 73
EP - 81
VL - 1597
IS - 1
DP - DeepDyve
ER -