TY - JOUR
AU1 - Kumarshiro, Yukinobu
AU2 - Yazawa, Naoki
AU3 - Misawa, Shunji
AU4 - Itoh, Akio
AB - The characteristics of a RF plasma for the crystal growth of nitrides with high dissociation pressures are described. The electrical behavior measured with a new ammeter is sensitive to both gas composition and ambient pressure. A VN rod was melted under optimum conditions of 400 torr in an Ar-N2 mixed plasma to demonstrate that the present crystals have nearly the same composition as those obtained by RF induction heating under 10 atm of nitrogen. This is direct evidence of chemical dissociation of nitrogen from the melt being suppressed by means of the RF plasma gas.
TI - RF plasma zone melting apparatus
JF - Plasma Chemistry and Plasma Processing
DO - 10.1007/BF00566023
DA - 2004-10-16
UR - https://www.deepdyve.com/lp/springer-journals/rf-plasma-zone-melting-apparatus-foUQ6rlIu1
SP - 249
EP - 257
VL - 3
IS - 2
DP - DeepDyve
ER -