TY - JOUR
AU - DeSimone, Joseph M.
AB - Two routes have been pursued toward the fabrication of photoresists for next-generation microlithography, using condensed carbon dioxide as the processing solvent. Addition polymers containing a norbornyl backbone were synthesized to include fluorinated moieties and chemical amplification switching groups. Other polymers, synthesized free radically in condensed CO 2 , include partially fluorinated backbones. These materials have been characterized and their lithographic properties evaluated. Solubility differences between exposed and non-exposed resist have been observed in these novel systems, which should provide the necessary contrast for high-resolution imaging.
TI - Photoresists for CO 2 -based next-generation microlithography
JF - Proceedings of SPIE
DO - 10.1117/12.599565
DA - 2005-05-04
UR - https://www.deepdyve.com/lp/spie/photoresists-for-co-2-based-next-generation-microlithography-a32uiFIQs0
SP - 487
EP - 490
VL - 5753
IS - 1
DP - DeepDyve
ER -