TY - JOUR
AU - Ruhl, Guenther G.
AB - One of the most critical steps for photomask CD off-target is the patterning of the mask. Here the instability of the dry etch process contributes directly to the stability of the CD value. The increasing demands on high-end masks cause a narrowing of both mask CD off-target and CD uniformity specifications, and accordingly the process stability has to be improved to fulfill these criteria. In this work we investigated the correlation between hardware parameters, basic etch process parameters and the corresponding CD mean-to-target value. Correlations between CD mean-to-target and Cr etch rate as well as effects of chamber seasoning after wet cleans are discussed.
TI - Investigation of Cr etch chamber seasoning
JF - Proceedings of SPIE
DO - 10.1117/12.568015
DA - 2004-06-02
UR - https://www.deepdyve.com/lp/spie/investigation-of-cr-etch-chamber-seasoning-Zx71m0Zay0
SP - 129
EP - 138
VL - 5504
IS - 1
DP - DeepDyve
ER -