TY - JOUR
AU1 - Babu, S. V.
AU2 - Srinivasan, V.
AB - We derive a general relation that exhibits the interdependence of the exposure and development processes in determining the contrast and the sensitivity curve of any photo-resist. We show,that for several limiting cases, the contrast is given by the reciprocal of the (pre-or post-expose) optical density of the resist, in agreement with the measured contrasts for PR102, AZ2400 and Dupont 2041 Elvacite PMMA resists. We also calculate the dependence of the threshold exposure energy D/35, and the dose Dp required to completely develop the resist, and hence, the contrast, on development time for a hypothetical solvent and simulate the results obtained using MF314 developer.
TI - Optical Density And Contrast Of Positive Photoresists
JF - Proceedings of SPIE
DO - 10.1117/12.947812
DA - 1985-04-18
UR - https://www.deepdyve.com/lp/spie/optical-density-and-contrast-of-positive-photoresists-ZXOd7P65CT
SP - 36
EP - 43
VL - 539
IS - 
DP - DeepDyve
ER -