TY - JOUR
AU - Harned, Noreen
AB - Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure challenges still remain, this technology is expected to begin high-volume microchip production within the next three years.
TI - Lithography gets extreme
JF - Nature Photonics
DO - 10.1038/nphoton.2009.251
DA - 2010-01-01
UR - https://www.deepdyve.com/lp/springer-journals/lithography-gets-extreme-YoRzNjOuEL
SP - 24
EP - 26
VL - 4
IS - 1
DP - DeepDyve
ER -