TY - JOUR
AU - Westwood, W. D.
AB - SummarySputtering provides a very useful method for preparing a wide range of materials in thin film form. Since the advent of magnetron systems, providing higher deposition rates and very flexible configurations, sputter deposition has been applied in many applications from microelectronics to decorative coating of automobiles. The high energy of sputtered atoms and the plasma environment make it possible to deposit a wide variety of films, some not obtainable otherwise, with good control over the film properties. Sputtering is not a simple technique, but it is a powerful one when used appropriately.
TI - Sputter Deposition Processes
JF - MRS Bulletin
DO - 10.1557/s0883769400063697
DA - 1988-12-01
UR - https://www.deepdyve.com/lp/springer-journals/sputter-deposition-processes-XrGFfDP0sv
SP - 46
EP - 51
VL - 13
IS - 12
DP - DeepDyve
ER -