TY - JOUR
AU - Jung,
AB -  CHx films on silicon substrates deposited by a Mesh Hollow Cathode Process (MHC) were analyzed by various techniques. The films were produced with varying deposition times, resulting in thicknesses ranging from ~2–20 nm. X-Ray Reflectivity (XRR) was used to determine the film thicknesses and the deposition rate. A good correlation of measured XRR thicknesses with SIMS sputter depths down to the film–substrate transition was found.
TI - Analytical characterization of thin carbon films
JF - Analytical and Bioanalytical Chemistry
DO - 10.1007/s00216-002-1667-2
DA - 2003-01-03
UR - https://www.deepdyve.com/lp/springer-journals/analytical-characterization-of-thin-carbon-films-WaO9JoyzI0
SP - 47
EP - 52
VL - 375
IS - 1
DP - DeepDyve
ER -