TY - JOUR
AU1 - Dearnaley, Geoffrey
AB - Summary The process of ion implantation, already widely adopted for the reliable manufacture of semiconductor devices, has now been developed as a highly sophisticated method of tailoring the surfaces of materials to resist wear and corrosion. Mechanisms exist that can bring about long-lasting improvements in performance despite the shallow penetration of the ions. Equipment has been designed to reduce the cost of the process, so as to be competitive with more conventional metal-finishing treatments. This article emphasizes applications to engineering tools and components already used in production. Factors of three- to five-fold increases in life are achieved in a variety of materials including steels and cemented carbides. Some developments which seem likely to extend widely the applications of the process are described.
TI - Practical Applications of Ion Implantation
JF - JOM
DO - 10.1007/BF03338092
DA - 1982-09-01
UR - https://www.deepdyve.com/lp/springer-journals/practical-applications-of-ion-implantation-V7I3jznxmm
SP - 18
EP - 28
VL - 34
IS - 9
DP - DeepDyve
ER -