TY - JOUR
AU - Agranat, Aharon J.
AB - Refractive index engineering (RI_Eng) by ion implantations is a generic methodology for constructing multi-component integrated circuits of electrooptic and nanophotonic devices with sub-wavelength features operating in the visible - near IR wavelengths. The essence of the method is to perform spatially selective implantations for sculpting complex 3D pre-designed amorphized patterns with sub-wavelength features and reduced refractive index within the volume of the substrate. A number of devices that were constructed in a substrate of potassium lithium tantalate niobate are described, including a submerged slab waveguide, an optical wire and a channel waveguide array.
TI - Refractive index engineering by fast ion implantations: a generic method for constructing multi-components electro-optical circuits
JO - Proceedings of SPIE
DO - 10.1117/12.841287
DA - 2010-02-12
UR - https://www.deepdyve.com/lp/spie/refractive-index-engineering-by-fast-ion-implantations-a-generic-UYAPl3jweB
SP - 76040Y
EP - 76040Y-17
VL - 7604
IS - 1
DP - DeepDyve
ER -