TY - JOUR
AU - Ju, Xin
AB - Using TEM copper grid with different pitch size as physical mask, alkanethiolates self-assembled monolayers was patterned by a metastable helium atom beam, demonstrating pattern transfer with nanoscale edge width to the underlying gold film. We found that the mask was reproduced as positive- or negative patterns with high fidelity, and the repetition of lithographic patterns was good in different runs.
TI - Mask technologies for metastable atom lithography: photomask and physical mask
JF - Proceedings of SPIE
DO - 10.1117/12.507555
DA - 2003-08-26
UR - https://www.deepdyve.com/lp/spie/mask-technologies-for-metastable-atom-lithography-photomask-and-StjQOjI3TX
SP - 1055
EP - 1058
VL - 5130
IS - 1
DP - DeepDyve
ER -