TY - JOUR
AU1 - Chen, Li
AU2 - Wang, Xinsheng
AU3 - Suzuki, Masafumi
AU4 - Yoshimura, Noboru
AB - According to the analytical aim and the dimension of the model, the photometric property of light source can be described either directly or indirectly in Monte Carlo lighting simulation. In this research, the simulations on the luminous intensity characteristics of louvered luminaire and the reflection characteristics of IC substrate are taken as models for the direct and indirect expressions of the luminous flux of light source. The advantage and differences of both methods are compared based on the respective simulation results. This study supplies a selection basis for the use of Monte Carlo techniques in lighting simulation. 
TI - Comparison of Direct and Indirect Photometric Descriptions in Monte Carlo Lighting Simulation
JF - Japanese Journal of Applied Physics
DO - 10.1143/JJAP.39.4786
DA - 2000-08-01
UR - https://www.deepdyve.com/lp/iop-publishing/comparison-of-direct-and-indirect-photometric-descriptions-in-monte-Mwb4tF6mNB
SP - 4786
VL - 39
IS - 8R
DP - DeepDyve
ER -