TY - JOUR
AU - Brander, R W
AB - G Carter and W A Grant London: E Arnold 1976 pp viii + 214 price £9.50 (cased) £5.95 (paperback)The implantation of ions into semiconductor materials has many advantages over conventional diffusion techniques and has enabled devices of improved performance and yield to be fabricated. Similarly the process has become of interest in other fields and it is unfortunate that this book, which is intended for undergraduate studies, is not more general in its coverage.
TI - Ion Implantation of Semiconductors
JO - Physics Bulletin
DO - 10.1088/0031-9112/27/12/035
DA - 1976-12-01
UR - https://www.deepdyve.com/lp/iop-publishing/ion-implantation-of-semiconductors-LUY0dGg1T4
SP - 553
VL - 27
IS - 12
DP - DeepDyve
ER -