TY - JOUR
AU1 - Barratt, Curt
AB - The technique of dry etching as applied to the patterning of thin films is described, and compared to wet etching in terms of the etch precision and in terms of the usage and disposal of etch chemicals. The etch requirements of three representative display technologies (AMLCD, FED and EL) are outlined, and the range of plasma etch processes which are applicable to these requirements is described.
TI - Dry etching for the fabrication of flat panel displays
JF - Proceedings of SPIE
DO - 10.1117/12.207515
DA - 1995-04-24
UR - https://www.deepdyve.com/lp/spie/dry-etching-for-the-fabrication-of-flat-panel-displays-Hgj3SiR004
SP - 215
EP - 219
VL - 2408
IS - 1
DP - DeepDyve
ER -