TY - JOUR
AU - Sukhanov, Ya.
AB - In the second part of the review, we pursue our analysis of plasma process monitoring by measuring the physical and physicochemical properties of a plasma during the process. Mass spectrometry methods, as well as probe and microwave techniques, for diagnostics of a plasma used in etching and deposition of semiconductor and insulating micro- and nanolayers are considered.
TI - In situ Diagnostics of Plasma Processes in Microelectronics: The Current Status and Prospects. Part II
JO - Russian Microelectronics
DO - 10.1023/A:1011352908277
DA - 2014-08-01
UR - https://www.deepdyve.com/lp/springer-journals/in-situ-diagnostics-of-plasma-processes-in-microelectronics-the-GnEw2FibUI
SP - 137
EP - 154
VL - 30
IS - 3
DP - DeepDyve
ER -