TY - JOUR
AU - Engstrom, Herbert L.
AB - Visible and ultraviolet light reflectometry provides a fast, convenient, and nondestructive method of characterizing multilayer film structures that include polycrystalline silicon. Reflectance measurements of silicon wafers containing such films have provided information as to the roughness of the poly surface, the thickness of the films, and the optical properties of the poly.
TI - Measuring films on and below polycrystalline silicon using reflectometry
JF - Proceedings of SPIE
DO - 10.1117/12.44467
DA - 1991-07-01
UR - https://www.deepdyve.com/lp/spie/measuring-films-on-and-below-polycrystalline-silicon-using-BDazPs9108
SP - 566
EP - 573
VL - 1464
IS - 1
DP - DeepDyve
ER -