TY - JOUR
AU1 - Pfeiffer, Frauke
AB - The aim of the paper is the development of an all-dry photolithographic process in which the film preparation step as well as the development step is performed without the use of solvent. To implement an all-dry photoresist system we focused on coumarin derivatives, as this class can be photodimerized in the solid state and features sufficient high thermal stability. The dimerized product exhibits sufficiently different physical properties. The monomer can be evaporated at elevated temperatures whereas the dimerized product remains non-volatile under these conditions. With a tailored glass forming coumarin derivative we demonstrated the capability to develop clear patterns. A combinatorial approach, i.e. producing a compositional library in combination with the variation of exposure dose was utilized to efficiently optimize the all-dry photoresist system.
TI - All-dry photoresist systems: physical vapor deposition of molecular glasses
JF - Proceedings of SPIE
DO - 10.1117/12.771101
DA - 2008-03-14
UR - https://www.deepdyve.com/lp/spie/all-dry-photoresist-systems-physical-vapor-deposition-of-molecular-AbhBhb7Uqw
SP - 69231F
EP - 69231F-8
VL - 6923
IS - 1
DP - DeepDyve
ER -