TY - JOUR
AU1 - Inaba, Hiroshi
AU2 - Kokaku, Yuuichi
AU3 - Terakado, Masatomo
AU4 - Kataoka, Hiroyuki
AB - We developed a radio-frequency-plasma-enhanced chemical vapor deposition (CVD) method with a positively self-biased electrode system.    This method enables simultaneous ion-assisted deposition on both sides of a vertically suspended substrate at a grounded electrical potential with one rf generator. In the positively    self-biased electrode system, the cathode sheath is located close to the grounded electrode. Accordingly, positive ions are accelerated toward the grounded electrode, producing an    ion-assisted reaction on the surface of the substrate. The grounded substrate is advantageous when transporting a substrate holder suspended vertically in an in-line multilayer    deposition system. An important feature of this electrode is the electrical capacitance between the hollow anode chamber and the ground which is parallel to the sheath capacitance.    Application of the electrode to the deposition process of thin film magnetic recording disks in pure methane gas was investigated. Diamond-like carbon (DLC) films were deposited    at a rate of 3 nm/s on the magnetic layer, with uniform film thickness within ±5% over a substrate measuring 95 mm in diameter. Analysis of this film showed that its characteristics are essentially the same as those of    DLC film deposited by the conventional method using a cathode sheath on a high-voltage electrode. 
TI - Development of CH4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition     Method    with a Positively Self-Biased Electrode for Diamond-Like Carbon Film
JF - Japanese Journal of Applied Physics
DO - 10.1143/JJAP.36.2817
DA - 1997-05-01
UR - https://www.deepdyve.com/lp/iop-publishing/development-of-ch4-radio-frequency-plasma-enhanced-chemical-vapor-ADXF8hkwWN
SP - 2817
VL - 36
IS - 5R
DP - DeepDyve
ER -