TY - JOUR
AU - Taylor, R M
AB -  The revived interest in the preparation and purification of semiconductors by electrochemical means stems mainly from the need to develop econo­ mical techniques for fabricating solar cells. Electrodeposition offers the hope of a means of conveniently producing large area samples inexpen­ sively, utilizing a technology readily adapted to industrial production. In addition, electrodeposition is an alternative technique for the preparation of semiconductors for certain electronic devices, particularly thin film transistors for flat panel displays. Therefore, this review will concentrate on the electrodeposition of semiconductors of current technological interest. However, many of the considerations reviewed are also applicable to all semiconductors. Fundamental thermodynamic and kinetic considerations that relate to the formation of elemental, and alloy or compound semiconductors are presented initially, followed by a summary of selected practical matters. Finally, recent work describing the electrodeposition of specific semi­ conductors is reviewed. FUNDAMENTAL CONSIDERATIONS Electrodeposition of Elemental Semiconductors Many of the key parameters in the electrodeposition of elemental semiconductors are similar to those encountered in electroplating. For this 197 0084-6600/85/0801-0197$02.00 FULOP & TAYLOR brief summary, they may be conveniently grouped into thermodynamic and kinetic considerations. THERMODYNAMICS The familiar Nernst equation for the potential, EM, of a metal electrode in a 
TI - Electrodeposition of Semiconductors
JF - Annual Review of Materials Research
DO - 10.1146/annurev.ms.15.080185.001213
DA - 1985-08-01
UR - https://www.deepdyve.com/lp/annual-reviews/electrodeposition-of-semiconductors-9qWw5cBIpm
SP - 197
EP - 210
VL - 15
IS - 1
DP - DeepDyve
ER -