TY - JOUR
AU - Choeysuppaket, A
AB - Titanium aluminium (TiAl) alloy thin films were deposited on silicon wafer and stainless steel substrate by sputtering method. The effects of the Al/Ti target current ratio (R) on chemical composition, structure, surface morphology, wettability, and corrosion resistance of the deposited films were investigated using energy dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), contact angle measurement, and potentiostat, respectively. In the experiment, when the Al/Ti target current ratio increased from 0.375 to 1.5, the Al/Ti concentration ratio of the deposited films increased. When the Al/Ti target current ratios were 1.0 and 1.5, the deposited film structure exhibited γ-TiAl phase with tetragonal crystal structure. Moreover, the Al/Ti target current ratio of 1.5 provided the deposited film with the highest crystallinity, surface roughness, hydrophobicity, and corrosion resistance.
TI - Effects of the ratio of Al/Ti target current on the chemical composition, structure, morphology, wettability and corrosion resistance of sputtered titanium aluminium films
JF - Journal of Physics: Conference Series
DO - 10.1088/1742-6596/2013/1/012011
DA - 2021-09-01
UR - https://www.deepdyve.com/lp/iop-publishing/effects-of-the-ratio-of-al-ti-target-current-on-the-chemical-9Jy1n1Gjo3
VL - 2013
IS - 1
DP - DeepDyve
ER -