TY - JOUR
AU1 - Tolstogouzov, Alexander
AU2 - Kitaeva, Tatyana
AU3 - Volkov, Stepan
AB - Apparatus, software and methods were developed for a microbeam analysis of semiconductor structures or devices based on Si and GaAs with secondary ion mass spectrometry. Semiquantitative analysis methods were based on measuring the relative elemental sensitivity factors. As examples of apparatus and methods applications investigations of various semiconductor materials and devices are described.
TI - SIMS imaging: Apparatus and applications
JF - Microchimica Acta
DO - 10.1007/BF01244577
DA - 2005-02-16
UR - https://www.deepdyve.com/lp/springer-journals/sims-imaging-apparatus-and-applications-8OJcMRY3sL
SP - 505
EP - 510
VL - 115
IS - 1
DP - DeepDyve
ER -