TY - JOUR
AU - Zhou, Wenbin
AB - A novel cationic photosensitive resin (3DSLR-01) for stereolithography 3D printing was prepared with 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexane carboxylate (2021P), 1,4-cyclohexanedimethanol glycidyl ether (JX-026), diglycidyl 4,5-epoxycyclohexane-1,2-dicarboxylate (S-186), polycaprolactone polyol(Polyol-0305), novolac epoxy resin(F-51), bis(3-ethyl-3-oxetanylmethyl) ether (S-221) and a mixture of triarylsulfonium hexafluoroantimonate salts solution (UVI-6976). The properties of the photosensitive resin and its UV-cured films were investigated by some instruments and equipment. The experimental results show that the critical exposure (E
c) of the photosensitive resin is 16.3 mJ/cm2, the penetration depth (D
p) is 0.14 mm, and the optical property of the photosensitive resin is excellent. Rectangle plates were printed by using a stereolithography apparatus (HRPL-150A) with the photosensitive resin as the manufacturing material, and the shrinkage rates of the plates were less than 0.60%, which showed that the accuracy of the manufactured plates was very high.
TI - Preparation of a Novel Cationic Photosensitive Resin (3D-SLR01) for Stereolithography 3D Printing and Determination of Its Some Properties
JF - Journal of Wuhan University of Technology-Mater. Sci. Ed.
DO - 10.1007/s11595-019-2114-y
DA - 2019-08-05
UR - https://www.deepdyve.com/lp/springer-journals/preparation-of-a-novel-cationic-photosensitive-resin-3d-slr01-for-3m4yQQHoyx
SP - 761
EP - 768
VL - 34
IS - 4
DP - DeepDyve
ER -