TY - JOUR
AU1 - Stremilova, N.
AU2 - Volynskaya, M.
AU3 - Shigina, L.
AB - CONTAMINATION OF GeC14 BY HANDLING EQUIPMENT N. N. Stremilova, M. P. Volynskaya, UDC 543.42 and L. N. Shigina Advances in semiconductor production have producedincreasinglystringent specifications for purity of initial materials, including GeC14. The material of the apparatus is important in the production of a highly pure compound, and we have recorded IR spectra of GeC14 stored for 6 months in tubes of glass, quartz, polyethylene, vinyl plastic, and PTFE. we used an IKS-21 single-beam spectrometer with an NaC1 prism over the range 4000-700 cm -1 with ceils 1.5 cm thick. The bands were interpreted in terms of pub- lished IR spectra [1-4]. PTFE gave the purest product (curve 5 of Fig. 1), with only traces of SiC14 and Si2OC16 [1]. Air always contains a certain amount of Si2OC16, so the bands of this will appear even if it is absent from the compound. GeC14 stored in PTFE shows a 1267 cm -~ band corresponding to compounds such as CH2C12 [2]. This band was weak in the layer thickness used, and hardly any absorption was observed at 3010 cm -1 (the main C-H stretching band in CH 3 and CH 2 groups). The same applies for the 1380 and 1460 
TI - Contamination of GeCl4 by handling equipment
JF - Journal of Applied Spectroscopy
DO - 10.1007/BF02628144
DA - 2007-05-03
UR - https://www.deepdyve.com/lp/springer-journals/contamination-of-gecl4-by-handling-equipment-2ZTWGbYS0h
SP - 1020
EP - 1021
VL - 9
IS - 3
DP - DeepDyve
ER -