TY - JOUR
AU - Ivliev, N.
AB - A tribometric device designed for rapid monitoring of the concentrations of atomic and molecular contaminants on the surfaces of semiconductor and dielectric substrates within the range of 10−7–10−10 g/cm2 is described. The method is based on measurements of the static and sliding friction coefficients between the investigated surfaces. The arrangement of interacting substrates forming a point contact and allowing elimination of disturbances in the crystal structure in the slip region at loads in the range of 0–3.7 N and angles between the substrates of 0–15° is shown.
TI - Measuring the surface purity of substrates by the tribometry method
JF - Instruments and Experimental Techniques
DO - 10.1134/S0020441214040174
DA - 2014-09-23
UR - https://www.deepdyve.com/lp/springer-journals/measuring-the-surface-purity-of-substrates-by-the-tribometry-method-1xN5L5EOdR
SP - 640
EP - 645
VL - 57
IS - 5
DP - DeepDyve
ER -