%0 Journal Article
%T Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL)
%A Waskiewicz, Warren K.
%J Proceedings of SPIE
%V 3155
%N 1
%P 2-13
%@ 0277-786X
%D 1997-09-25
%I SPIE
%~ DeepDyve