%0 Journal Article
%T Faraday/Ion Mass Spectroscopy Dosimeter for Plasma Immersion Ion Implantation/Plasma Doping Processes of Semiconductor Manufacturing
%A Qin, Shu
%A McTeer, Allen
%A ,
%J IEEE Transactions on Plasma Science
%V 36
%N 3
%P 828-833
%@ 0093-3813
%D 2008-06-01
%I Institute of Electrical and Electronics Engineers (IEEE)
%~ DeepDyve