%0 Journal Article
%T Development of 250W EUV light source for HVM lithography
%A Mizoguchi, Hakaru
%A Nakarai, Hiroaki
%A Abe, Tamotsu
%A Nowak, Krzysztof M.
%A Kawasuji,, Yasufumi
%A Tanaka, Hiroshi
%A Watanabe, Yukio
%A Hori, Tsukasa
%A Kodama, Takeshi
%A Shiraishi, Yutaka
%A Yanagida, Tatsuya
%A Yamada, Tsuyoshi
%A Yamazaki, Taku
%A Okazaki, Shinji
%A Saitou, Takashi
%J Proceedings of SPIE
%V 10097
%P 1009702-1009702-7
%@ 0277-786X
%D 2017-02-22
%I SPIE
%~ DeepDyve