%0 Journal Article
%T Design and synthesis of new photoresist materials for ArF lithography
%A Seo, Hwang‐Un
%A Jin, Sung‐Ho
%A Choi, Sang‐Jun
%A Gal, Yeong‐Soon
%A Lim, Kwon Taek
%J Journal of Applied Polymer Science
%V 92
%N 1
%P 165-170
%@ 0021-8995
%D 2004-01-05
%I Wiley Subscription Services, Inc., A Wiley Company
%~ DeepDyve