%0 Journal Article
%T Newly Developed High-Speed Rotating Disk Chemical Vapor Deposition Equipment for Poly-Si Films
%A Terai, Fujio
%A Kobayashi, Hiroaki
%A Katsui, Shuji
%A Sato, Yuusuke
%A Nagatomo, Takao
%A Homma, Tetsuya
%J Japanese Journal of Applied Physics
%V 44
%N 1R
%@ 0021-4922
%D 2005-01-01
%~ DeepDyve