%0 Journal Article
%T Influence of Deposition Conditions on the Properties of Silicon Nitride Films Prepared by the ECR Plasma CVD Method
%A Hirao, Takashi
%A Setsune, Kentaro
%A Kitagawa, Masatoshi
%A Kamada, Takeshi
%A Wasa, Kiyotaka
%A Izumi, Tomio
%J Japanese Journal of Applied Physics
%V 26
%N 12R
%@ 0021-4922
%D 1987-12-01
%~ DeepDyve