%0 Journal Article
%T Wide-Range Threshold Voltage Controllable Silicon on Thin Buried Oxide Integrated with Bulk Complementary Metal Oxide Semiconductor Featuring Fully Silicided NiSi Gate Electrode
%A Ishigaki, Takashi
%A Tsuchiya, Ryuta
%A Morita, Yusuke
%A Sugii, Nobuyuki
%A Kimura, Shinichiro
%A Iwamatsu, Toshiaki
%A Ipposhi, Takashi
%A Inoue, Yasuo
%A Hiramoto, Toshiro
%J Japanese Journal of Applied Physics
%V 47
%N 4S
%@ 0021-4922
%D 2008-04-01
%~ DeepDyve