%0 Journal Article
%T Improved MSRN-Based Attention Block for Mask Alignment Mark Detection in Photolithography
%A Park, Juyong
%A Jeong, Jongpil
%J Applied Sciences
%V 12
%N 5
%@ 2076-3417
%D 2022-03-06
%I Multidisciplinary Digital Publishing Institute
%~ DeepDyve