%0 Journal Article
%T Geometrically induced dose correction method for e-beam lithography applications
%A Galler, R.
%A Choi, K.-H.
%A Krueger, M.
%A Ramos, L. E.
%A Suelzle, M.
%A Weidenmueller, U.
%J Proceedings of SPIE
%V 7823
%N 1
%P 78231E-78231E-9
%@ 0277-786X
%D 2010-09-24
%I SPIE
%~ DeepDyve