%0 Journal Article
%T Ozone cleaning of the Si-SiO2 system
%A Baumgärtner, H.
%A Fuenzalida, V.
%A Eisele, I.
%J Applied Physics A: Materials Science  Processing
%V 43
%N 3
%P 223-226
%@ 0947-8396
%D 2004-10-26
%I Springer-Verlag
%~ DeepDyve