%0 Journal Article
%T Advanced statistical process control: controlling sub-0.18-ॖm lithography and other processes
%A Zeidler, Amit
%A Veenstra, Klaas-Jelle
%A Zavecz, Terrence E.
%J Proceedings of SPIE
%V 4344
%N 1
%P 312-322
%@ 0277-786X
%D 2001-08-22
%I SPIE
%~ DeepDyve