%0 Journal Article
%T Designing materials for advanced microelectronic patterning applications using controlled polymerization RAFT technology
%A Sheehan, Michael T.
%A Farnham, William B.
%A Chambers, Charles R.
%A Tran, Hoang V.
%A Okazaki, Hiroshi
%A Brun, Yefim
%A Romberger, Matthew L.
%A Sounik, James R.
%J Proceedings of SPIE
%V 7972
%N 1
%P 79720T-79720T-12
%@ 0277-786X
%D 2011-03-17
%I SPIE
%~ DeepDyve