%0 Journal Article
%T Characterization of an ultra-thick positive photoresist for electroplating applications
%A Flack, Warren W.
%A Capsuto, Elliott S.
%J Proceedings of SPIE
%V 5039
%N 1
%P 1257-1271
%@ 0277-786X
%D 2003-06-11
%I SPIE
%~ DeepDyve