%0 Journal Article
%T Investigating Slurry Transport Beneath a Wafer during Chemical Mechanical Polishing Processes
%A Coppeta, J.
%A Rogers, C.
%A Racz, L.
%A Philipossian, A.
%A Kaufman, F. B.
%J Journal of the Electrochemical Society
%V 147
%N 5
%P 1903-1909
%@ 0013-4651
%D 2000-05-01
%~ DeepDyve