%0 Journal Article
%T High-power EUV light sources (>500w) for high throughput in next-generation EUV lithography tools
%A Hummler, Klaus
%A Zhu, Qiushi
%A Behm, Keegan
%A Matthes, Liane
%A He, Zhaohan
%A Biabani, Omar
%A LaForge, Andrew
%A Rollinger, Bob
%A Urone, Dustin
%A Kleemans, Niek
%A Jurna, Martin
%A McGrogan, Sean
%A Mayer, Peter
%A Purvis, Michael
%A Derks, Sander
%A Villalta, Alberto
%A Govindaraju, Abhiram
%A Ma, Yue
%A Brown, Daniel
%J Proceedings of SPIE
%V 12953
%P 129530V-129530V-8
%@ 0277-786X
%D 2024-04-10
%I SPIE
%~ DeepDyve