%0 Journal Article
%T Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma
%A Matsuo, Seitaro
%A Kiuchi, Mikiho
%J Japanese Journal of Applied Physics
%V 22
%N 4A
%@ 0021-4922
%D 1983-04-01
%~ DeepDyve