%0 Journal Article %T Surface Planarization of Strain-Relaxed SiGe Buffer Layers by CMP and Post Cleaning %A Sawano, K. %A Kawaguchi, K. %A Koh, S. %A Hirose, Y. %A Hattori, T. %A Nakagawa, K. %A Shiraki, Y. %J Journal of the Electrochemical Society %V 150 %N 7 %P G376-G379 %@ 0013-4651 %D 2003-05-12 %~ DeepDyve